Cleanroom: Difference between revisions
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=== Instruments === | === Instruments === | ||
{| class="wikitable" | {| class="wikitable" | ||
|- | |- | ||
! Manual !! Procedure | ! Manual !! Procedure | ||
| Line 8: | Line 6: | ||
| [[Spinner]] || [[Spinner_procedure| Spinner]] | | [[Spinner]] || [[Spinner_procedure| Spinner]] | ||
|- | |- | ||
| [[ | | [[Hot plate ]] || | ||
|- | |- | ||
| [[ | | [[Optical mask aligner]] || [[Optical mask aligner_procedure |Optical mask aligner]] | ||
|- | |||
| [[Ion beam etching]] || [[Ion beam etching_procedure | Ion Beam etching]] | |||
|} | |} | ||
=== Photoresist === | === Photoresist === | ||
[[Positive | [[Microposit S1800 - Positive Photoresit - Datasheet]] <br> | ||
[[Negative MA-N]] | [[Negative MA-N]] | ||
=== Developer === | === Developer === | ||
Latest revision as of 18:13, 14 August 2025
Instruments[edit | edit source]
| Manual | Procedure |
|---|---|
| Spinner | Spinner |
| Hot plate | |
| Optical mask aligner | Optical mask aligner |
| Ion beam etching | Ion Beam etching |
Photoresist[edit | edit source]
Microposit S1800 - Positive Photoresit - Datasheet
Negative MA-N