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(Created page with "Spinner Optical mask aligner Photoresist Positive S1800 Negative MA-N Developer") |
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[[Spinner]] | === Instruments === | ||
[[Optical mask aligner]] | {| class="wikitable" | ||
|- | |||
! Manual !! Procedure | |||
|- | |||
| [[Spinner]] || [[Spinner_procedure| Spinner]] | |||
|- | |||
| [[Hot plate ]] || | |||
|- | |||
| [[Optical mask aligner]] || [[Optical mask aligner_procedure |Optical mask aligner]] | |||
|- | |||
| [[Ion beam etching]] || [[Ion beam etching_procedure | Ion Beam etching]] | |||
|} | |||
=== Photoresist === | |||
Photoresist | [[Microposit S1800 - Positive Photoresit - Datasheet]] <br> | ||
[[Positive | |||
[[Negative MA-N]] | [[Negative MA-N]] | ||
Developer | === Developer === | ||
Latest revision as of 18:13, 14 August 2025
Instruments[edit | edit source]
| Manual | Procedure |
|---|---|
| Spinner | Spinner |
| Hot plate | |
| Optical mask aligner | Optical mask aligner |
| Ion beam etching | Ion Beam etching |
Photoresist[edit | edit source]
Microposit S1800 - Positive Photoresit - Datasheet
Negative MA-N